Cleaning principle of low temperature plasma processor
Plasma low-temperature plasma treatment machine and the like are the density of electrons and positive ions is substantially equal to the ionized gas. It consists of ions, electrons, free radicals, photons, and neutral particles. It is the fourth state of matter.
Usually, substances are generally considered to have three states: solid, liquid, and gaseous. Distinguishing these three states depends on how much energy is contained in the matter. The gaseous state is the highest energy state of the three states of matter.
More energy to the gaseous material, such as heating, will form a plasma. When it reaches the plasma state, the gaseous molecules split into many highly active particles. These fissiones are not permanent. Once the energy used to form the plasma disappears, the various types of particles recombine to form the original gas molecules.
The use of low-temperature plasma treatment technology has been applied in the fields of chemical synthesis, thin film preparation, surface treatment and fine chemicals since the 1960s, in the field of large-scale or ultra-large-scale integrated circuit processes for drying and lowering, in recent years. The dry-process process technologies such as plasma polymerization, plasma etching, plasma ashing, and plasma anodization have also been developed. Plasma cleaning technology is also one of the progress of process drying.
Different mechanism and wet clean, plasma cleaning is to rely on in a "plasma state" substance "activation" to achieve the purpose of removing the surface stains. From the current various cleaning methods, plasma cleaning is also the most thorough stripping cleaning of all cleaning methods. At present, the use of plasma cleaning is quite common in China. Especially in recent years, with the advancement of these high-tech products, such as plasma TVs, plasma cutting machines, etc., the high-tech technology of plasma has a close relationship with our industrial products.
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